Specific Process Knowledge/Lithography: Difference between revisions
| Line 190: | Line 190: | ||
| style="width: 20%"| | | style="width: 20%"| | ||
'''<big>[[Specific Process Knowledge/Lithography/Descum|Descum]]</big>''' | '''<big>[[Specific Process Knowledge/Lithography/Descum|Descum]]</big>''' | ||
*[[Specific Process Knowledge/Lithography/Strip# | *[[Specific Process Knowledge/Lithography/Strip#Plasma_asher|Plasma Asher 1]] | ||
*[[Specific Process Knowledge/Lithography/Strip# | *[[Specific Process Knowledge/Lithography/Strip#Plasma_Asher_2|Plasma Asher 2]] | ||
*[[Specific_Process_Knowledge/Etch/Wet_Silicon_Oxide_Etch_(BHF)|BHF]] | *[[Specific_Process_Knowledge/Etch/Wet_Silicon_Oxide_Etch_(BHF)|BHF]] | ||
| Line 198: | Line 198: | ||
'''<big>[[Specific Process Knowledge/Lithography/Strip|Strip]]</big>''' | '''<big>[[Specific Process Knowledge/Lithography/Strip|Strip]]</big>''' | ||
*[[Specific Process Knowledge/Lithography/Strip# | *[[Specific Process Knowledge/Lithography/Strip#Plasma_asher|Plasma Asher 1]] | ||
*[[Specific Process Knowledge/Lithography/Strip# | *[[Specific Process Knowledge/Lithography/Strip#Plasma_Asher_2|Plasma Asher 2]] | ||
*[[Specific Process Knowledge/Lithography/Strip# | *[[Specific Process Knowledge/Lithography/Strip#Resist_Strip|Resist Strip]] | ||
'''<big>[[Specific_Process_Knowledge/Lithography/NanoImprintLithography|NanoImprint Lithography]]</big>''' | '''<big>[[Specific_Process_Knowledge/Lithography/NanoImprintLithography|NanoImprint Lithography]]</big>''' | ||