Specific Process Knowledge/Etch/Aluminum Oxide/Al2O3 Etch using HF: Difference between revisions
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<li> 5% HF: 1.74 nm/s </li> | <li> 5% HF: 1.74 nm/s </li> | ||
<li> 1vol. H<sub>2</sub>O : 1vol. 5% HF 1.05 nm/s </li> | <li> 1vol. H<sub>2</sub>O : 1vol. 5% HF 1.05 nm/s </li> | ||
<li> 2vol. H<sub>2</sub>O : 1vol. 5% HF 0. | <li> 2vol. H<sub>2</sub>O : 1vol. 5% HF 0.72 nm/s </li> | ||
</ul> | </ul> | ||