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Specific Process Knowledge/Etch/Aluminum Oxide/Al2O3 Etch using HF: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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A wet chemical etch of Al<sub>2</sub>O<sub>3</sub> can be done with HF. The etch rate depends on the HF concentration.  
A wet chemical etch of Al<sub>2</sub>O<sub>3</sub> can be done with HF. The etch rate depends on the HF concentration.  
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