Specific Process Knowledge/Characterization: Difference between revisions
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*[[/SEM: Scanning Electron Microscopy/Jeol|JEOL SEM]] | *[[/SEM: Scanning Electron Microscopy/Jeol|JEOL SEM]] | ||
===[[/AFM: Atomic Force Microscopy|AFM: Atomic Force Microscopy]] | ===[[/AFM: Atomic Force Microscopy|AFM: Atomic Force Microscopy]]=== | ||
*[[/AFM: Atomic Force Microscopy#Nanoman|Nanoman - ''AFM'']] | *[[/AFM: Atomic Force Microscopy#Nanoman|Nanoman - ''AFM'']] | ||
Revision as of 10:38, 12 January 2009
Choose topic
- Sample imaging
- Topographic measurement
- Stress measurement
- Measurement of film thickness and optical constants
- Wafer thickness measurement - writer: Yvonne
- Element analysis
- Hydrophobicity measurement - writer: Jonas
- Resistivity measurement - writer: Jan
- Other electrical measurements - writer: Jan