Specific Process Knowledge/Etch/Aluminum Oxide/Al2O3 Etch using HF: Difference between revisions
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The etch rates: | The etch rates: | ||
<ul> | |||
<li> 5% HF: 1.74 nm/s </li> | |||
<li> 1vol. H<sub>2</sub>O : 1vol. 5% HF 1.05 nm/s </li> | |||
<li> 2vol. H<sub>2</sub>O : 1vol. 5% HF 0.723 nm/s </li> | |||
</ul> | |||
Be aware of that the 5% HF etches quite fast - Actually so fast that it can be tricky to control the etch. Just imagine, you take a sample out of solution and place it in a bigger water container to rinse, and during that movement, the etch continues… So the handling things around the fumehood can be a source of errors. | Be aware of that the 5% HF etches quite fast - Actually so fast that it can be tricky to control the etch. Just imagine, you take a sample out of solution and place it in a bigger water container to rinse, and during that movement, the etch continues… So the handling things around the fumehood can be a source of errors. | ||
''Evgeniy Shkondin, DTU Nanolab, June 2019'' | ''Evgeniy Shkondin, DTU Nanolab, June 2019'' | ||