Jump to content

Specific Process Knowledge/Characterization/Four-Point Probe: Difference between revisions

Paphol (talk | contribs)
Paphol (talk | contribs)
Line 66: Line 66:


==Overview of the performance of the Four-Point Probe at DTU Nanolab==
==Overview of the performance of the Four-Point Probe at DTU Nanolab==
{| border="2" cellspacing="0" cellpadding="2"
|-
!style="background:silver; color:black;" align="center"|Equipment
|style="background:WhiteSmoke; color:black"|'''Four point probe - Jandel'''
|style="background:WhiteSmoke; color:black"| '''Four point probe - Veeco'''
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Purpose
|style="background:WhiteSmoke; color:black"|Measure voltage, sheet resistance or volume resistivity at varied current
|style="background:WhiteSmoke; color:black"|Measure resistance, resistivity or film thickness(*) at 100uA
|-
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|(*) Knowing resistivity
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates
|style="background:WhiteSmoke; color:black"|Small chips up to 8inch wafer
|style="background:WhiteSmoke; color:black"|4inch wafer or 6inch wafer
|-
|}


{| border="1" cellspacing="0" cellpadding="4"  
{| border="1" cellspacing="0" cellpadding="4"