Specific Process Knowledge/Characterization/Four-Point Probe: Difference between revisions
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!style="background:silver; color:black;" align="center"|Equipment | !style="background:silver; color:black;" align="center"|Equipment | ||
|style="background: | |style="background:WhiteSmoke; color:black"|'''Four point probe - Jandel''' | ||
|style="background:WhiteSmoke; color:black"| '''Four point probe - Veeco''' | |style="background:WhiteSmoke; color:black"| '''Four point probe - Veeco''' | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"| | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Purpose | ||
|style="background: | |style="background:WhiteSmoke; color:black"|Measure voltage, sheet resistance or volume resistivity | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Room temperature | *Room temperature | ||
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|style="background: | |style="background:WhiteSmoke; color:black"|Process pressure | ||
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*1 atm | *1 atm | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates | ||
|style="background: | |style="background:WhiteSmoke; color:black"|Batch size | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*1 4" wafer per measurement | *1 4" wafer per measurement | ||
*1 6" wafer per measurement | *1 6" wafer per measurement | ||
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| style="background: | | style="background:WhiteSmoke; color:black"|Substrate material allowed | ||
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*Silicon wafers | *Silicon wafers | ||
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