Specific Process Knowledge/Characterization/Four-Point Probe: Difference between revisions
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[[Image:Jandel_four_point_probe.PNG |thumb|400x400px|Four point probe: positioned in cleanroom D-3]] | [[Image:Jandel_four_point_probe.PNG |thumb|400x400px|Four point probe: positioned in cleanroom D-3]] | ||
'''The Four point probe is manufactured by Jandel Engineering Limited''' and using Jandel probe head and the RM3000+ Test Unit which can supply constant current between 10nA and 99.99mA, and measure voltage from 0.01mV to 1250mV. | '''The Four point probe is manufactured by Jandel Engineering Limited''' and using Jandel probe head, a cylindrical probe type B: 1.00 mm spacing, 100 micron tip radius, 100g load linear is being use at Nanolab.and the RM3000+ Test Unit which can supply constant current between 10nA and 99.99mA, and measure voltage from 0.01mV to 1250mV. | ||
For sheet resistance measurements, the quoted range is 1 milliohm/square to 5x108 ohms/square. Measurements outside this range are possible but with possible reduced accuracy. | For sheet resistance measurements, the quoted range is 1 milliohm/square to 5x108 ohms/square. Measurements outside this range are possible but with possible reduced accuracy. | ||
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Multiposition Probe stand can measure on wafers up to 200mm diameter. The Θ movement clicks in four positions at 90 degrees and the linear movement in up to 10 positions giving repeat placement accuracy of +/- 1mm. | Multiposition Probe stand can measure on wafers up to 200mm diameter. The Θ movement clicks in four positions at 90 degrees and the linear movement in up to 10 positions giving repeat placement accuracy of +/- 1mm. | ||
==Four-Point Probe from Veeco== | ==Four-Point Probe from Veeco== | ||