Specific Process Knowledge/Lithography/4562: Difference between revisions

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==Spin coating==
==Spin coating==


[[Image:MiRspincurves.JPG|500x500px|thumb|Spin curves for AZ MiR 701 (29cps) using a 30s spin-off, and a 60s@90°C softbake (proximity bake for Gamma)]]
[[Image:4562spincurves.JPG|500x500px|thumb|Spin curves for AZ MiR 701 (29cps) using a 30s spin-off, and a 60s@90°C softbake (proximity bake for Gamma)]]


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Revision as of 09:16, 24 July 2019

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AZ 4562 is a positive UV photoresist for thick coatings (5µm and above).

Priming

Spin coating

Spin curves for AZ MiR 701 (29cps) using a 30s spin-off, and a 60s@90°C softbake (proximity bake for Gamma)


Exposure

Development

The recommended development speed for AZ 4562 is 2µm/min. A