Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300: Difference between revisions

Revision as of 08:32, 29 June 2017 view source Bghe (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,318 edits →A rough overview of the performance of IBE/IBSD Ionfab 300 and some process related parameters ← Older edit		Revision as of 08:26, 26 June 2019 view source Bghe (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,318 edits →IBE/IBSD Ionfab 300: milling, dry etching and deposition in the same tool Newer edit →
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	[[Image:IBE_IBSD_udstyret_i_RR1.jpg\|300x300px\|thumb\|IBE and IBSD: positioned in cleanroom A-1]]		[[Image:IBE_IBSD_udstyret_i_RR1.jpg\|300x300px\|thumb\|IBE and IBSD: positioned in cleanroom A-1]]

	IBE/IBSD Ionfab 300 was manufactored by Oxford Instruments Plasma Technology. It was installed at ~~Danchip~~ in 2011.		IBE/IBSD Ionfab 300 was manufactored by Oxford Instruments Plasma Technology. It was installed at Nanolab in 2011.