Specific Process Knowledge/Etch/DRIE-Pegasus/DUVetch: Difference between revisions
| Line 250: | Line 250: | ||
|+ '''Process parameters''' | |+ '''Process parameters''' | ||
|- | |- | ||
! rowspan=" | ! rowspan="3" width="100"| Recipe | ||
! rowspan=" | ! rowspan="3" width="20"| Step | ||
! rowspan="2" width="20"| Temp. | ! rowspan="2" width="20"| Temp. | ||
! colspan="6" | Deposition step | ! colspan="6" | Deposition step | ||
| Line 271: | Line 271: | ||
! width="40" | Coil | ! width="40" | Coil | ||
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Platen power|Platen]] | | [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Platen power|Platen]] | ||
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Hardware | HW]] | | rowspan="2" | [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Hardware | HW]] | ||
! width="40" | Runs | ! width="40" rowspan="2" | Runs | ||
! width="300" | Key words | ! width="300" | Key words | ||
|- | |||
| degs | |||
| s | |||
| mt | |||
| sccm | |||
| sccm | |||
| sccm | |||
| W | |||
| s | |||
| mt | |||
| sccm | |||
| sccm | |||
| sccm | |||
| W | |||
| W | |||
|- | |- | ||
! polySOI-10 <!-- recipe name --> | ! polySOI-10 <!-- recipe name --> | ||