Jump to content

Specific Process Knowledge/Etch/DRIE-Pegasus/DUVetch: Difference between revisions

← Older editNewer edit →
VisualWikitext
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
Line 156: Line 156:
|+ '''Process parameters'''
|+ '''Process parameters'''
|-
|-
! rowspan="3" width="100"| Recipe
! rowspan="4" width="100"| Recipe
! rowspan="3" width="20"| Step
! rowspan="4" width="20"| Step
! rowspan="3" width="20"| Temp.
! rowspan="3" width="20"| Temp.
! colspan="6" | Deposition step
! colspan="6" | Deposition step
Line 176: Line 176:
! width="40" colspan="2"| Coil  
! width="40" colspan="2"| Coil  
! width="40" colspan="2"| Platen  
! width="40" colspan="2"| Platen  
! width="40" rowspan="2"| [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Hardware | HW]]  
! width="40" rowspan="3"| [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Hardware | HW]]  
! width="40" rowspan="2"| Runs
! width="40" rowspan="3"| Runs
! width="300" rowspan="2"| Keywords
! width="300" rowspan="3"| Keywords
|-
|-
! width="20" | B
! width="20" | B
Line 194: Line 194:
! width="20" | B
! width="20" | B
! width="20" | M
! width="20" | M
|-
| degs
| s
| mt
| sccm
| sccm
| sccm
| W
| s
| s
| %
| mt
| sccm
| sccm
| sccm
| sccm
| sccm
| sccm
| W
| W| W| W
|-
|-
! NBoost04  <!--recipe name  -->
! NBoost04  <!--recipe name  -->
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/DUVetch"