Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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==Advanced Field alignment (TSA)== | ==Advanced Field alignment (TSA)== | ||
'''Overlay accuracy ( | '''Overlay accuracy (spec):''' 0.25µm (5x5mm<sup>2</sup> area) | ||
Shift, rotation, scaling, and shearing is determined and set by global alignment marks. The shift is corrected by automatic alignment to one mark in each field (chip). | Shift, rotation, scaling, and shearing is determined and set by global alignment marks. The shift is corrected by automatic alignment to one mark in each field (chip). | ||