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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
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'''Overlay accuracy (specs):''' 0.25µm (5x5mm<sup>2</sup> area)
'''Overlay accuracy (specs):''' 0.25µm (5x5mm<sup>2</sup> area)


*4 marks, 25 fields (375nm, high res camera)
Shift, rotation, scaling, and shearing is determined and set by global alignment marks. The shift is corrected by automatic alignment to one mark in each field (chip).
*Scaled first print, 10 fields (375nm, high res camera)
*4 marks, 25 fields (405nm, high res camera)


{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
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