Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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==Advanced Field alignment (TSA)== | ==Advanced Field alignment (TSA)== | ||
'''Overlay accuracy (specs):''' 0.25µm ( | '''Overlay accuracy (specs):''' 0.25µm (5x5mm<sup>2</sup>/min area) | ||
*4 marks, 25 fields (375nm, high res camera) | *4 marks, 25 fields (375nm, high res camera) | ||