Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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==Defocus== | ==Defocus== | ||
'''Optical''' | '''Optical:''' Varies greatly with resist type and thickness. Probably also dependent on substrate. | ||
'''Pneumatic''' | '''Pneumatic:''' Probably similar for resists of similar thickness, and not likely to vary with substrate. For 375nm exposure, the optimum seems to be around -15 (). | ||
==Exposure mode== | ==Exposure mode== | ||