LabAdviser/Courses: Difference between revisions
Appearance
| Line 502: | Line 502: | ||
**Sputtering | **Sputtering | ||
*CVD (chemical vapour depostion) | *CVD (chemical vapour depostion) | ||
**LPCVD | **LPCVD (low pressure chemical vapour deposition) | ||
**PECVD | **PECVD (plasma enhanced chemical vapour deposition) | ||
*ALD (atomic layer deposition) | *ALD (atomic layer deposition) | ||
| Line 547: | Line 547: | ||
|- | |- | ||
|} | |} | ||
<br clear="all" /> | |||
===Slides from the lectures=== | |||
<big>Slides from lecture 1</big> | |||
*Lecture slide show [[Media:1_DTU_Nanolab_Thin_Film_TPT_final_May2019.pptx]] | *Lecture slide show [[Media:1_DTU_Nanolab_Thin_Film_TPT_final_May2019.pptx]] | ||
<big>Slides from lecture 2</big> | |||
*Lecture slide show [[Media:2_DTU_Nanolab_Thin_Film_TPT_final_May2019.pptx]] | *Lecture slide show [[Media:2_DTU_Nanolab_Thin_Film_TPT_final_May2019.pptx]] | ||