Jump to content

Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

← Older editNewer edit →
VisualWikitext
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,530 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,530 edits
Line 725: Line 725:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|rowspan="2" align="center"|KOH-window
|rowspan="2" align="center"|KOH-window, ? points
|'''X'''
|'''X'''
| 0.0±0.5
| 0.0±0.0


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|'''Y'''
|'''Y'''
| 0.0±0.5
| 0.0±0.0


|}
|}
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Aligners/Aligner:_Maskless_02_processing"