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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 259: Line 259:
|rowspan="2"|405 nm
|rowspan="2"|405 nm
|'''X'''
|'''X'''
| kjhf
| 532±64
| 100
| 251
|rowspan="2" align="mid"| 0.000
|rowspan="2" align="mid"| 333


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|'''Y'''
|'''Y'''
| 101
| 599±58
| 0.2±0.05
| 382


|-
|-
Line 273: Line 273:
|rowspan="2"|375 nm
|rowspan="2"|375 nm
|'''X'''
|'''X'''
| kjhf
| 556±44
| 100
| 214
|rowspan="2" align="mid"| 0.000
|rowspan="2" align="mid"| 347


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|'''Y'''
|'''Y'''
| 101
| 579±63
| 0.2±0.05
| 224


|}
|}
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