Jump to content

Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

← Older editNewer edit →
VisualWikitext
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 258: Line 258:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|rowspan="2"|405 nm
|rowspan="2"|405 nm
|'''X'''
| kjhf
| 100
|rowspan="2" align="mid"| 0.000
|-
|-style="background:WhiteSmoke; color:black"
|'''Y'''
| 101
| 0.2±0.05
|-
|-style="background:WhiteSmoke; color:black"
|rowspan="2"|375 nm
|'''X'''
|'''X'''
| kjhf
| kjhf
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Aligners/Aligner:_Maskless_02_processing"