Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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'''Fast''' mode is used for maximum exposure speed. | '''Fast''' mode is used for maximum exposure speed. | ||
In the fast mode, each area of the pattern is exposed by 2 stripes only. This effectively cuts the exposure time in half, but also doubles the size of the address grid in the X-direction. Due to less averaging of non-uniformities, stitching effects will be more prominent in this mode. | In the fast mode, each area of the pattern is exposed by 2 stripes only. This effectively cuts the exposure time in half, but also doubles the size of the address grid in the X-direction. Due to less averaging of non-uniformities, stitching effects will be more prominent in this mode. | ||
==Writing speed== | ==Writing speed== | ||
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<br clear="all" /> | <br clear="all" /> | ||
==Acceptance test== | |||
*SAT results? | |||
=Features= | =Features= | ||