Jump to content

Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

← Older editNewer edit →
VisualWikitext
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 200: Line 200:
| -6 (Feb 2019) <br> -2 (Apr 2019)
| -6 (Feb 2019) <br> -2 (Apr 2019)
| <750 nm
| <750 nm
| PEB: 60s@110°C, Dev: SP60s
| PEB: 60s@110°C, Dev: SP60s <br> Probably over-exposed
|-
|-


Line 212: Line 212:
| 5
| 5
| ~1 µm (not optimized)
| ~1 µm (not optimized)
| Dev: SP60s
| Dev: SP60s <br> Probably under-exposed
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
| Quality
| Quality
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Aligners/Aligner:_Maskless_02_processing"