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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 180: Line 180:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!rowspan="2"| AZ MiR 701
!rowspan="3"| AZ MiR 701
|rowspan="2"| 1.5 µm
|rowspan="3"| 1.5 µm
| 405 nm
| 405 nm
| Fast
| Fast
Line 189: Line 189:
| PEB: 60s@110°C, Dev: SP60s
| PEB: 60s@110°C, Dev: SP60s
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
| 375 nm
|rowspan="2"| 375 nm
| Both
| Fast
| Fast: 170 mJ/cm<sup>2</sup> <br> Quality: 180 mJ/cm<sup>2</sup>
| 170 mJ/cm<sup>2</sup>
| Fast: -5 <br> Quality: -6
| -5
| Fast: 1 µm <br> Quality: <750 nm
| 1 µm
| PEB: 60s@110°C, Dev: SP60s
|-style="background:WhiteSmoke; color:black"
| Quality
| 180 mJ/cm<sup>2</sup>
| -6 (Feb 2019) <br> -2 (Apr 2019)
| <750 nm
| PEB: 60s@110°C, Dev: SP60s
| PEB: 60s@110°C, Dev: SP60s
|-
|-
Line 199: Line 205:
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
! AZ nLOF 2020
!rowspan="2"| AZ nLOF 2020
| 2 µm
|rowspan="2"| 2 µm
| 375 nm
|rowspan="2"| 375 nm
| Both
| Fast
| Fast: 400 mJ/cm<sup>2</sup> <br> Quality: 400 mJ/cm<sup>2</sup>
| 400 mJ/cm<sup>2</sup>
| Fast: 5 <br> Quality: 0
| 5
| Fast: ~1 µm (not optimized) <br> Quality: 1 µm
| ~1 µm (not optimized)
| Dev: SP60s
| Dev: SP60s
|-style="background:LightGrey; color:black"
| Quality
| 400 mJ/cm<sup>2</sup>
| 0
| 1 µm
| Dev: SP60s <br> Probably under-exposed
|-
|-


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