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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,794 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,794 edits
Line 128: Line 128:
!Thickness
!Thickness
!Laser
!Laser
!Exposure mode
!Dose
!Dose
!Defoc
!Defoc
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|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!AZ 5206E
!rowspan="2"| AZ 5206E
|0.5 µm
|rowspan="2"| 0.5 µm
| 375 nm
|rowspan="2"| 375 nm
| Fast: 60 mJ/cm<sup>2</sup> <br> Quality: 60 mJ/cm<sup>2</sup>
| Fast
| Fast: -6 <br> Quality: -6
| 60 mJ/cm<sup>2</sup>
| Fast: 1 µm (not optimized) <br> Quality: ~750 nm (not optimized)
| -6
| 1 µm (not optimized)
| Dev: 2xSP30s
|-style="background:WhiteSmoke; color:black"
| Quality
| 60 mJ/cm<sup>2</sup>
| -6
| ~750 nm (not optimized)
| Dev: 2xSP30s
| Dev: 2xSP30s
|-
|-
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|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!rowspan="2"|AZ 5214E
!rowspan="3"| AZ 5214E
|rowspan="2"|1.5 µm
|rowspan="3"| 1.5 µm
| 405 nm
| 405 nm
| Fast: 90 mJ/cm<sup>2</sup>
| Fast  
| Fast: -2
| 90 mJ/cm<sup>2</sup>
| Fast: 1-2 µm
| -2
| 1-2 µm
| Dev: SP60s
|-style="background:LightGrey; color:black"
|rowspan="2"| 375 nm
| Fast
| 65 mJ/cm<sup>2</sup>
| 2
| ~1 µm
| Dev: SP60s
| Dev: SP60s
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
| 375 nm
| Quality
| Fast: 65 mJ/cm<sup>2</sup> <br> Quality: 65 mJ/cm<sup>2</sup>
| 65 mJ/cm<sup>2</sup>
| Fast: 2 <br> Quality: 2
| 2
| Fast: ~1 µm <br> Quality: ~750 nm
| ~750 nm
| Dev: SP60s
| Dev: SP60s
|-
|-
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|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!rowspan="2"|AZ MiR 701
!rowspan="2"| AZ MiR 701
|rowspan="2"|1.5 µm
|rowspan="2"| 1.5 µm
| 405 nm
| 405 nm
| Fast: 200 mJ/cm<sup>2</sup>
| Fast
| Fast: -5
| 200 mJ/cm<sup>2</sup>
| Fast: ~1 µm (not optimized)
| -5
| ~1 µm (not optimized)
| PEB: 60s@110°C, Dev: SP60s
| PEB: 60s@110°C, Dev: SP60s
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
| 375 nm
| 375 nm
| Both
| Fast: 170 mJ/cm<sup>2</sup> <br> Quality: 180 mJ/cm<sup>2</sup>
| Fast: 170 mJ/cm<sup>2</sup> <br> Quality: 180 mJ/cm<sup>2</sup>
| Fast: -5 <br> Quality: -6
| Fast: -5 <br> Quality: -6
Line 184: Line 202:
| 2 µm
| 2 µm
| 375 nm
| 375 nm
| Both
| Fast: 400 mJ/cm<sup>2</sup> <br> Quality: 400 mJ/cm<sup>2</sup>
| Fast: 400 mJ/cm<sup>2</sup> <br> Quality: 400 mJ/cm<sup>2</sup>
| Fast: 5 <br> Quality: 0
| Fast: 5 <br> Quality: 0
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