Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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[[Image:MLA150_speedVSarea.JPG|400x400px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm) as a function of the exposure area]] | [[Image:MLA150_speedVSarea.JPG|400x400px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm) as a function of the exposure area]] | ||
'''Speed vs. area:''' | |||
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[[Image:MLA150 speedVSdose.JPG|400x400px|thumb|The writing speed of Aligner: Maskless 02 as a function of the exposure dose]] | [[Image:MLA150 speedVSdose.JPG|400x400px|thumb|The writing speed of Aligner: Maskless 02 as a function of the exposure dose]] | ||
'''Speed vs. dose:''' | |||
The writing speed remains almost constant up to a dose of 1000mJ/cm<sup>2</sup>. Due to the higher power of the 405nm laser, the writing speed remains high up to a dose of 1000mJ/cm<sup>2</sup> for this wavelength. After this point, the writing speed decreases almost linearly with dose. For 375nm, the writing speed is 50% at a dose of 4500mJ/cm<sup>2</sup>, while 405nm requires a dose of 8500mJ/cm<sup>2</sup> to drop to that speed. | The writing speed remains almost constant up to a dose of 1000mJ/cm<sup>2</sup>. Due to the higher power of the 405nm laser, the writing speed remains high up to a dose of 1000mJ/cm<sup>2</sup> for this wavelength. After this point, the writing speed decreases almost linearly with dose. For 375nm, the writing speed is 50% at a dose of 4500mJ/cm<sup>2</sup>, while 405nm requires a dose of 8500mJ/cm<sup>2</sup> to drop to that speed. | ||
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'''Speed vs. design:''' | |||
Design case: 5 100µm wide, 40mm long lines, spaced 10mm apart (40x40mm<sup>2</sup>) | |||
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