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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 137: Line 137:
*Speed vs. design
*Speed vs. design


Design: 5 100µm wide, 40mm long lines, spaced 10mm apart (40x40mm<sup>2</sup>)
'''Design case: 5 100µm wide, 40mm long lines, spaced 10mm apart (40x40mm<sup>2</sup>)'''


{| cellpadding="2" style="border: 2px solid darkgray;" align="right"
{| cellpadding="2" style="border: 2px solid darkgray;" align="right"
Line 144: Line 144:


|- border="0" align="center"
|- border="0" align="center"
|[[Image:Labspin_2.JPG|300px]]
|[[Image:MLA150_LongLinesEW.JPG|300px]]
|[[Image:Labspin_3_+_fumehood_11.JPG|300px]]
|[[Image:MLA150 LongLinesNS.JPG|300px]]


|- align="center"
|- align="center"
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