Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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*Rotation: 0.5±0.2° | *Rotation: 0.5±0.2° | ||
*Centering: | *Centering: | ||
**X | **X 100±250µm | ||
**Y | **Y 200±250µm | ||
The error on the flat alignment is surprising when compared to the 0±0.1° measured on Aligner: Maskless 01. The centring, on the other hand, is seen to be within a few hundred µm, without correcting for the flats. | The error on the flat alignment is surprising when compared to the 0±0.1° measured on Aligner: Maskless 01. The centring, on the other hand, is seen to be within a few hundred µm, without correcting for the flats. | ||