Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

@@ Line 149: / Line 149: @@
 *Substrate centering + flat alignment test
+'''Result of loading the same substrate 9 times without removing it from the stage:'''
+{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
+|-
+|-
+|-style="background:silver; color:black"
+!
+!Average [mRad]
+!Range [mRad]
+|-
+|-
+|-style="background:WhiteSmoke; color:black"
+|Optical
+autofocus
+|3.7
+|±13.9
+|-
+|-style="background:WhiteSmoke; color:black"
+|Pneumatic
+autofocus
+|-3.7
+|±1.4
+|}
+<br clear="all" />
 ==Labeling==