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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 332: Line 332:
'''Field of view:''' <br>
'''Field of view:''' <br>
'''High Res''' 190µm x 140µm <br>
'''High Res''' 190µm x 140µm <br>
'''Low Res:''' 640µm x 480µm <br>
'''Low Res''' 640µm x 480µm <br>
'''Overview:''' 12mm x 9mm
'''Overview''' 12mm x 9mm


*4 marks (before final installation)
*4 marks (before final installation)
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