Jump to content

Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

← Older editNewer edit →
VisualWikitext
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
Line 477: Line 477:


==Back Side Alignment==
==Back Side Alignment==
'''BSA windows:''' along the X and Y axes, 10mm x 46mm, starting 14.5mm from the center.


'''Field of view:''' 640µm x 480µm
'''Field of view:''' 640µm x 480µm
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Aligners/Aligner:_Maskless_02_processing"