Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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Aligner: Maskless 02 offers two exposure modes: 'high quality' (4) for optimal resolution and minimum stripe stitching effects; and 'fast' for maximum exposure speed. | Aligner: Maskless 02 offers two exposure modes: 'high quality' (4) for optimal resolution and minimum stripe stitching effects; and 'fast' for maximum exposure speed. | ||
'''High quality (4):''' | |||
In the high quality mode, an area of the pattern is exposed by 4 stripes, each 160µm wide and exposing a quarter of the dose. At the same time, sub-pixel interpolation is applied, yielding an address grid size of 40nm. | |||
'''Fast:''' | |||
In the fast mode, each area of the pattern is exposed by 2 stripes only. This effectively cuts the exposure time in half, but also doubles the size of the address grid in the X-direction. Due to less averaging of non-uniformities, stitching effects will be more prominent in this mode. | |||
==Resolution== | ==Resolution== | ||