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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 352: Line 352:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|rowspan="2"|4 alignment marks
|rowspan="2"|4 alignment marks
(three samples)
375nm, high res camera
|'''X'''
|'''X'''
| 0±0
| 0±0
|rowspan="2" align="center"|0.002±0.001
|rowspan="2" align="center"|0.000±0.000
| 0.0±0.05
| 0.0±0.05
| 0.0±0.05
| 0.0±0.05
Line 372: Line 372:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|rowspan="2"|2 alignment marks
|rowspan="2"|4 alignment marks
after calibration
405nm, high res camera
(three samples)
|'''X'''
|'''X'''
|NA
|NA
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