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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,794 edits
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==Labeling==
==Labeling==
[[Image:MLA150_label.JPG|400x400px|thumb|An example of wafer ID produced by the labeling function]]


HIMT\Designs\Labels\labelfile.lbl (tab-delimited ASCII file with special header).
HIMT\Designs\Labels\labelfile.lbl (tab-delimited ASCII file with special header).
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Some special characters are not allowed (e.g. ';').
Some special characters are not allowed (e.g. ';').


[[Image:MLA150_label.JPG|400x400px|thumb|An example of wafer ID produced by the labeling function]]
<br clear="all" />


==High Aspect Ratio (DOF) mode==
==High Aspect Ratio (DOF) mode==
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