Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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Decreasing the aperture size significantly reduces the amount of light that reaches the sample, and thus the effective dose, as can be seen in the graph to the right, and the table below. The resolution, however, seem sto much less affected. Tests using 1.5µm MiR resist suggest that using the X-Large setting (aperture: 60 steps) reduces the achievable resolution from 1µm at standard setting (fully open; 800 steps) to 3µm for exposure at 375nm, and only 1.75µm for exposure at 405nm. | Decreasing the aperture size significantly reduces the amount of light that reaches the sample, and thus the effective dose, as can be seen in the graph to the right, and the table below. The resolution, however, seem sto much less affected. Tests using 1.5µm MiR resist suggest that using the X-Large setting (aperture: 60 steps) reduces the achievable resolution from 1µm at standard setting (fully open; 800 steps) to 3µm for exposure at 375nm, and only 1.75µm for exposure at 405nm. | ||
'''Dose factor for different | '''Dose factor for different wavelengths and aperture settings:''' | ||
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!colspan="2" align="center"|375nm | !colspan="2" align="center"|375nm | ||
!colspan="2" align="center"|405nm | !colspan="2" align="center"|405nm | ||
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|Large (100) | |Large (100) | ||
|X-Large (60) | |X-Large (60) | ||