Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
| Line 223: | Line 223: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Standard (800) | |Standard (800) | ||
6000 mJ/ | 6000 mJ/cm<sup>2</sup> | ||
|[[Image:5214E DEV HighResolution crop.jpg|350px]] | |[[Image:5214E DEV HighResolution crop.jpg|350px]] | ||
| Line 229: | Line 229: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Large (100) | |Large (100) | ||
16500 | 16500 mJ/cm<sup>2</sup> | ||
|[[Image:MiR HighResolution crop.jpg|350px]] | |[[Image:MiR HighResolution crop.jpg|350px]] | ||
| Line 236: | Line 236: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|X-Large (60) | |X-Large (60) | ||
55000 | 55000 mJ/cm<sup>2</sup> | ||
|[[Image:5214E HighResolution crop.jpg|350px]] | |[[Image:5214E HighResolution crop.jpg|350px]] | ||