Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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[[Image:MLA150_intensityVSaperture.JPG|300x300px|thumb|The exposure intensity of Aligner: Maskless 02 as a function of the high AR mode aperture setting]] | [[Image:MLA150_intensityVSaperture.JPG|300x300px|thumb|The exposure intensity of Aligner: Maskless 02 as a function of the high AR mode aperture setting]] | ||
'''Dose factor for different wavelength and aperture settings:''' | '''Dose factor for different wavelength and aperture settings:''' | ||
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'''Results from acceptance test:''' | |||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | |||
|- | |||
|- | |||
|-style="background:silver; color:black" | |||
! | |||
!150µm SU-8 | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Standard (800) | |||
6000 mJ/cm2 | |||
|[[Image:5214E DEV HighResolution crop.jpg|350px]] | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Large (100) | |||
16500 | |||
|[[Image:MiR HighResolution crop.jpg|350px]] | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|X-Large (60) | |||
55000 | |||
|[[Image:5214E HighResolution crop.jpg|350px]] | |||
|} | |||
<br clear="all" /> | <br clear="all" /> | ||