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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
Line 157: Line 157:
|-
|-
|-style="background:silver; color:black"
|-style="background:silver; color:black"
|
|Wavelength
!Large
!colspan="2" align="center"|375nm
!XLarge
!colspan="2" align="center"|405nm
|-
 
|-
|-style="background:silver; color:black"
!Aperture setting
|Large (100)
|X-Large (60)
|Large (100)
|X-Large (60)
|-
|-


Line 167: Line 176:
|3.3
|3.3
|17.4
|17.4
|5.7
|14.6
|-
|-


Line 175: Line 186:
|~3
|~3
|~10
|~10
|NA
|NA
|-
|-


|-
|-
|-style="background:LightGrey; color:black"
|-style="background:WhiteSmoke; color:black"
!1.5µm AZ MiR 701 dose tests
!1.5µm AZ MiR 701 dose tests
|7.5
|7.5
|20.8
|20.8
|6.7
18.0
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:LightGrey; color:black"
!10µm AZ 4562 dose tests
!10µm AZ 4562 dose tests
|?
|?
|?
|?
|?
|?
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