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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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MLA150_intensityVSaperture.JPG
MLA150_intensityVSaperture.JPG
[[Image:MLA150_intensityVSaperture.JPG|300x300px|thumb|Aligner: Maskless 01 positioned in E-5]]
[[Image:MLA150_intensityVSaperture.JPG|300x300px|thumb|The exposure intensity of Aligner: Maskless 02 as a function of the high AR mode aperture setting]]


*Intensity vs. aperture (405nm + 375nm)
*Intensity vs. aperture (405nm + 375nm)
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