Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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[[Image:AZ spectral sensitivity.gif|400x400px|thumb|Spectral sensitivity of AZ resists represented as optical absorption. From https://www.lithoprotect.com/]] | [[Image:AZ spectral sensitivity.gif|400x400px|thumb|Spectral sensitivity of AZ resists represented as optical absorption. From https://www.lithoprotect.com/]] | ||
Dose compared to 365nm exposure (using e.g. Aligner: MA6-2 or Aligner: Maskless 01): | |||
{|border="1" cellspacing="1" cellpadding="7" style="text-align:center;" | |||
|- | |||
|- | |||
|-style="background:silver; color:black" | |||
| | |||
!375nm | |||
!405nm | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!AZ 5214E | |||
|1 | |||
|1.15 <sup>1)</sup> | |||
|- | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
!AZ 4562 | |||
|1 | |||
|1.15 <sup>1)</sup> | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!AZ MiR 701 | |||
|1 | |||
|1.15 <sup>1)</sup> | |||
|- | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
!AZ nLOF 2020 | |||
|1 | |||
|1.15 <sup>1)</sup> | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!SU-8 | |||
|1 | |||
|1.15 <sup>1)</sup> | |||
|- | |||
|} | |||
<br clear="all" /> | <br clear="all" /> | ||