Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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Quality: 180mJ/cm<sup>2</sup>; defoc -6 (750nm) | Quality: 180mJ/cm<sup>2</sup>; defoc -6 (750nm) | ||
*'''nLOF''' | *'''nLOF 2020''' 2µm 375nm, PEB 60s@110°C dev SP60s | ||
Fast: 400mJ/cm<sup>2</sup>; defoc 5 (~1µm, not optimized) | Fast: 400mJ/cm<sup>2</sup>; defoc 5 (~1µm, not optimized) | ||