Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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==Resolution== | ==Resolution== | ||
*5206E 0.5µm 375nm, dev 2xSP30s | *'''5206E''' 0.5µm 375nm, dev 2xSP30s | ||
Fast: 60mJ/cm<sup>2</sup>; defoc -6 (1µm, not optimized) | Fast: 60mJ/cm<sup>2</sup>; defoc -6 (1µm, not optimized) | ||
Quality: 60mJ/cm<sup>2</sup>; defoc -6 (~750nm, not optimized) | Quality: 60mJ/cm<sup>2</sup>; defoc -6 (~750nm, not optimized) | ||
*5214E 1.5µm 405nm, dev SP60s | *'''5214E''' 1.5µm 405nm, dev SP60s | ||
Fast: 90mJ/cm<sup>2</sup>; defoc -2 (1-2µm) | Fast: 90mJ/cm<sup>2</sup>; defoc -2 (1-2µm) | ||
*5214E 1.5µm 375nm, dev SP60s | *'''5214E''' 1.5µm 375nm, dev SP60s | ||
Fast: 65mJ/cm<sup>2</sup>; defoc 2 (~1µm) | Fast: 65mJ/cm<sup>2</sup>; defoc 2 (~1µm) | ||
Quality: 65mJ/cm<sup>2</sup>; defoc 2 (~750nm) | Quality: 65mJ/cm<sup>2</sup>; defoc 2 (~750nm) | ||
*MiR 701 1.5µm 405nm, PEB 60s@110°C dev SP60s | *'''MiR 701''' 1.5µm 405nm, PEB 60s@110°C dev SP60s | ||
Fast: 200mJ/cm<sup>2</sup>; defoc -5 (~1µm, not optimized) | Fast: 200mJ/cm<sup>2</sup>; defoc -5 (~1µm, not optimized) | ||
*MiR 701 1.5µm 375nm, PEB 60s@110°C dev SP60s | *'''MiR 701''' 1.5µm 375nm, PEB 60s@110°C dev SP60s | ||
Fast: 170mJ/cm<sup>2</sup>; defoc -5 (1µm) | Fast: 170mJ/cm<sup>2</sup>; defoc -5 (1µm) | ||
Quality: 180mJ/cm<sup>2</sup>; defoc -6 (750nm) | Quality: 180mJ/cm<sup>2</sup>; defoc -6 (750nm) | ||
*nLOF 2020 2µm 375nm, PEB 60s@110°C dev SP60s | *'''nLOF''' 2020 2µm 375nm, PEB 60s@110°C dev SP60s | ||
Fast: 400mJ/cm<sup>2</sup>; defoc 5 (~1µm, not optimized) | Fast: 400mJ/cm<sup>2</sup>; defoc 5 (~1µm, not optimized) | ||