Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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[[Image:MLA150_speedVSarea.JPG|400x400px|thumb|The writing speed of Aligner: Maskless 02 as a function of the exposure area]] | [[Image:MLA150_speedVSarea.JPG|400x400px|thumb|The writing speed of Aligner: Maskless 02 (Fast mode) as a function of the exposure area]] | ||
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*Speed vs. dose (375nm + 405nm) | *Speed vs. dose (375nm + 405nm) | ||
[[Image:MLA150 speedVSdose.JPG|400x400px|thumb|The writing speed of Aligner: Maskless | [[Image:MLA150 speedVSdose.JPG|400x400px|thumb|The writing speed of Aligner: Maskless 02 (Fast mode) as a function of the exposure dose]] | ||