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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
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==Exposure dose==
==Exposure dose==


[[Image:AZ spectral sensitivity.gif|300x300px|thumb|Spectral sensitivity of AZ resists represented as optical absorption. From http://www.microchemicals.com/]]


==Defocus==
==Defocus==
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