Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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==Labelling== | ==Labelling== | ||
labelfile.lbl (tab-delimited ASCII file) | labelfile.lbl (tab-delimited ASCII file). Some special characters are not allowed (e.g. ';'). | ||
X | Y | UNIT | HEIGHT | UNIT | TITLE | X | Y | UNIT | HEIGHT | UNIT | TITLE | ||
| Line 76: | Line 76: | ||
-16000 | -46000 | um | 2000 | um | TARAN DTU Nanolab 20190320 | -16000 | -46000 | um | 2000 | um | TARAN DTU Nanolab 20190320 | ||
Some special characters are not allowed (e.g. ; ). | This produces a 2mm high, approximately 32mm long wafer ID at the flat of a 4" wafer. | ||
Some special characters are not allowed (e.g. ';'). | |||
=Alignment= | =Alignment= | ||