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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Line 19: Line 19:
*MiR 701 1.5µm 375nm (fast + quality)
*MiR 701 1.5µm 375nm (fast + quality)
*nLOF 2020 2µm 375nm (fast + quality)
*nLOF 2020 2µm 375nm (fast + quality)
*Substrate centering + flat alignment test


==Exposure dose==
==Exposure dose==
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