Specific Process Knowledge/Characterization: Difference between revisions
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===[[SEM: Scanning Electron Microscopy]]=== | ===[[SEM: Scanning Electron Microscopy]]=== | ||
*FEI SEM | *FEI SEM | ||
*JEOL SEM | *JEOL SEM | ||
*LEO SEM | |||
===[[AFM: Atomic Force Microscopy]]=== | ===[[AFM: Atomic Force Microscopy]]=== | ||
Revision as of 07:40, 18 October 2007
Choose topic
- Surface imaging
- Topographic measurement
- Stress measurement
- Filmthickness measurement
- Element analysis
- Measurement of optical constants
- Hydrophobicity measurement
- Resistivity measurement
- Wafer thickness measurement
Choose equipment
SEM: Scanning Electron Microscopy
- FEI SEM
- JEOL SEM
- LEO SEM
AFM: Atomic Force Microscopy
- Nanoman - AFM - can be used for nanomanipulation
Profiler
- Dektak 8 stylus profiler
- Tencor
Optical microscope
Optical characterization
- Ellipsometer
- Filmtek
- Prism Coupler
SIMS: Secondary Ion Mass Spectrometry
- Atomika SIMS