Specific Process Knowledge/Lithography/SU-8: Difference between revisions
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==Developing== | ==Developing== | ||
Developing of the SU-8 patterns is done in the [[ | Developing of the SU-8 patterns is done in the [[Specific_Process_Knowledge/Lithography/Development#SU8-Developer|special developing station]] placed in cleanroom C-1 at Danchip. Under developing the substrates are immersed in Propylene Glycol Methyl Ether Acetate (PGMEA) first in a bath marked "First" and after in a bath marked "Final". | ||
The development time is dependent on the layer thickness. | The development time is dependent on the layer thickness. | ||