Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions
| Line 541: | Line 541: | ||
!Thickness | !Thickness | ||
!Uniformity (+/-) | !Uniformity (+/-) | ||
!Spin-off speed | |||
!Test date | !Test date | ||
!Tester initials | !Tester initials | ||
| Line 549: | Line 550: | ||
|0.49 µm | |0.49 µm | ||
|0.9% | |0.9% | ||
|2200 rpm | |||
|23/4 2018? | |23/4 2018? | ||
|taran | |taran | ||
|4" wafer, no HMDS | |4" wafer, no HMDS. 9 points measured, exclusion zone 5mm. | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
| Line 557: | Line 559: | ||
|0.54 | |0.54 | ||
|0.4% | |0.4% | ||
|2200? rpm | |||
|30/1 2019 | |30/1 2019 | ||
|taran | |taran | ||
|4" wafer, with HMDS | |4" wafer, with HMDS. 9 points measured, exclusion zone 5mm. | ||
|} | |} | ||