Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions
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*Silicon oxides | *Silicon oxides | ||
*Photoresist | *Photoresist | ||
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Amorphous silicon can be used as a mask fro SiO2 etching. | |||
For very long and deep etches of SiO2/Quartz (several hours/micrometers) we have indications that show that it is not good to use the SiO etch. | |||
The amorphous silicon has small holes (etch pits) which the SiO etch penetrates and the SiO2 below is etched. | |||
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