Specific Process Knowledge/Thin film deposition/Wordentec: Difference between revisions
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More information about deposition rates and surface roughness can be found by clicking on the different elements. | More information about deposition rates and surface roughness can be found by clicking on the different elements. | ||
===Thickness measurement=== | |||
Read about how the machine measures the thickness of the growing film using a quartz crystal monitor [[Specific_Process_Knowledge/Thin_film_deposition/Temescal#Deposition_rate_and_thickness_measurement_accuracy|here]]. | |||
===Particulates in the films=== | |||
Read about some tests that we made of particulates in e-beam evaporated Al, Ni, and TiAu films made in the Wordentec and the Temescal | |||
[[Specific_Process_Knowledge/Thin_film_deposition/Temescal#Particulates_on_the_films|here]]. | |||
==Equipment performance and process related parameters Wordentec== | ==Equipment performance and process related parameters Wordentec== | ||